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3 article(s) from Winhold, Marcel

In situ growth optimization in focused electron-beam induced deposition

Paul M. Weirich,
Marcel Winhold,
Christian H. Schwalb and
Michael Huth

Beilstein J. Nanotechnol. 2013, 4, 919–926, doi:10.3762/bjnano.4.103

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Figure 1: Schematic representation of the optimization process: (a) Layer structure of FEBID deposits: m opti...

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Figure 2: Flow chart of the in situ optimization of conductance of FEBID deposits with a GA. After the initia...

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Figure 3: (a) Rate of change of conductance during the GA optimization for the W–C–O reference (green), GA-op...

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Figure 4: (a) Chemical composition of sample 1 (t_D = 100 μs), sample 2 (t_D = 0.5 μs) and sample 3 (t_D = 831 μ...

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Figure 5: Time-dependent rate of change of conductance for Pt–C deposits - The GA is applied for the optimiza...

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Full Research Paper

Published 17 Dec 2013

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Focused electron beam induced deposition: A perspective

Michael Huth,
Fabrizio Porrati,
Christian Schwalb,
Marcel Winhold,
Roland Sachser,
Maja Dukic,
Jonathan Adams and
Georg Fantner

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70

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Figure 1: Illustration of FEBID. Precursor molecules (here: organometallic complex; blue: metal, green: organ...

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Figure 2: Single-species growth rate calculated for the precursor Me₃Pt(IV)CpMe assuming three different elec...

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Figure 3: Molecular models of octanol (left) and Co₂(CO)₈ (right). Rendered using Jmol.

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Figure 4: Simulation of concentration of different elements in FEBID structure under parallel use of Co₂(CO)₈...

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Figure 5: Molecular models of Si₅H₁₂ (left) and Me₃Pt(IV)CpMe (right). Rendered using Jmol.

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Figure 6: Elemental composition of various Pt–Si deposits as determined by EDX according to [28]. The data were t...

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Figure 7: Dependence of the room temperature resistivity on the Si/Pt ratio in the FEBID samples according to ...

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Figure 8: Temperature-dependent conductivity of the Pt–Si FEBID samples represented as ln σ vs T⁻^a to facilit...

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Figure 9: TEM electron diffraction pattern of samples on carbon membrane before (left) and after (right) post...

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Figure 10: Temperature-dependent conductivity and Hall effect as a function of the applied magnetic field for ...

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Figure 11: Dependence of the yield ratio for the precursors Co₂(CO)₈ and Me₃Pt(IV)CpMe on the dwell time withi...

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Figure 12: Phase diagram of the transport regimes of granular metals. In the insulating regime for g < g_c ther...

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Figure 13: Temperature-dependent conductivity of Pt–C FEBID structures that have been exposed to different pos...

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Figure 14: Temperature-dependent conductivity of Pt–C FEBID structures that have been exposed to different pos...

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Figure 15: Calculated gauge factor κ as a function of intergrain coupling strength (bottom axis) and metal vol...

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Figure 16: Left: Strain-resistance effect of a Pt–C nanogranular sensor element measured on a test cantilever ...

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Video

Review

Published 29 Aug 2012

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Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

Britta Kämpken,
Verena Wulf,
Norbert Auner,
Marcel Winhold,
Michael Huth,
Daniel Rhinow and
Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

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Figure 1: SEM images of NWs grown on gold-sputtered Si[111] exposed to NPS vapor at 375 °C for 1 h (left: sid...

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Figure 2: Analysis of NWs grown on gold-sputtered Si[111] for 1 h at 375 °C. Top left: Backscattered-electron...

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Figure 3: TEM images of NWs grown on gold-sputtered Si[111] for 1 h at 375 °C. The FFT of the HRTEM image and...

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Figure 4: SEM images of NWs grown on gold-sputtered Si[111] by exposure to NPS vapor for 1 h at 650 °C.

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Figure 5: SEM image of gold nanoparticles formed on the native oxide surface of Si[111] after annealing of Au...

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Figure 6: SEM image of NWs grown at 650 °C for 1 h on Si[111] surfaces with annealed gold films (left: sample...

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Figure 7: SEM image of NWs grown at 375 °C for 1 h, on annealed gold films of different sputtering times (lef...

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Figure 8: SEM image of the chemisorbed gold nanoparticles on the aminopropylated Si[111] surface.

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Figure 9: SEM image of NWs grown from nanoparticles at 650 °C without prior treatment (left) and at 375 °C af...

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Figure 10: SEM images with different magnifications of a spin coated film of “liquid bright gold” on Si[111] a...

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Figure 11: SEM image of Si NWs obtained from spin-coated “liquid bright gold” films after annealing at 650 °C,...

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Figure 12: Optical microscopy images of the different steps of the irradiation-induced pattern formation. Left...

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Figure 13: SEM images (different magnifications) of Si NWs obtained from UV-patterned spin-coated “liquid brig...

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Figure 14: SEM image of the border region of a Si NW pattern obtained from UV-patterned “liquid bright gold” f...

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Full Research Paper

Published 25 Jul 2012

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